Research System Features and Options
25 mm thermal CVD system
125 mm PECVD system for 100 mm wafer processing- System Features
- Variety of process chambers, including quartz, alumina, and stainless steel
- Chip-level and wafer-level processing capability
- Configurable gas delivery module with Mass Flow Controllers
- Pneumatic valve options
- Purge and vacuum options
- Manifold options
- User-friendly graphical user interface
- Modular design to meet exact user specifications
- Helium leak tested
- Customer-specific process recipes
- Available Options and Upgrades
- Advanced heating options: rapid thermal, RF, or stage heater
- Guided and/ or actuated substrate loader
- Electric-field alignment module
- Automatic pressure control - standard for nanowire fabrication systems
- Integrated residual gas analyzer
- Operational status and interlock module with alarm - standard for nanowire fabrication systems
- RF plasma module
- Vapor bubbler module
- Catalysts and substrates
View some of the most popular system configurations we offer today.
Sample Structures Grown on Atomate Systems
ZnO nanowires
CNT cluster grown at 560°C
High density SWNT growth on patterned catalyst
CNT bundles grown from patterned catalyst at 650°C on Si substrateContact Atomate for more information on CVD systems.
